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Simultaneous achievement of high dielectric constant and low temperature dependence of capacitance in (111)-oriented BaTiO3-Bi(Mg0.5Ti0.5)O3-BiFeO3 solid solution thin films

机译：在（111）取向的BaTiO3-Bi（mg0.5Ti0.5）O3-BiFeO3固溶体薄膜中同时实现高介电常数和低温电容依赖性

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Junichi Kimura; Mohamed-Tahar Chentir; Takao Shimizu; Hiroshi Uchida; Hiroshi Funakubo;
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1. Simultaneous achievement of high dielectric constant and low temperature dependence of capacitance in (111)-oriented BaTiO3-Bi(Mg0.5Ti0.5)O3-BiFeO3 solid solution thin films [J] . Junichi Kimura, Mohamed-Tahar Chentir, Takao Shimizu, AIP Advances . 2016,第1期

机译：同时实现（111）取向BaTiO3-Bi（Mg0.5Ti0.5）O3-BiFeO3固溶体薄膜的高介电常数和电容的低温依赖性
2. Thickness and temperature dependences of dielectric properties of {111}-oriented epitaxial Pb(Mg_(1/3)Nb_(2/3))O_3 and 0.6Pb(Mg_(1/3)Nb_(2/3))O_3-0.4PbTiO_3 films [J] . Okamoto Shoji, Okamoto Satoshi, Yokoyama Shintaro, Japanese journal of applied physics . 2018,第9期

机译：{111}取向外延Pb（Mg_（1/3）Nb_（2/3））O_3和0.6Pb（Mg_（1 / 3Nb_（2/3））O_3-0.4介电性能的厚度和温度依赖性PbTiO_3膜
3. Strong Dependence on Thickness of Room-Temperature Dielectric Constant of (100)-Oriented Pb(Mg_(1/3) Nb_(2/3))O_3 Epitaxial Films Grown by Metal Organic Chemical Vapor Deposition [J] . Satoshi Okamoto, Shintaro Yokoyama, Shoji Okamoto, Japanese Journal of Applied Physics. Part 2, Letters & Express Letters . 2006,第37a41期

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4. Changes in the temperature dependence of the dielectric constant in irradiated antiferroelectric thin films [C] . Dmitry A. Lesnyh, Dmitry V. Kulikov, Yuri V. Trushin, Nondestructive Testing and Computer Simulations in Science and Engineering . 2003

机译：辐照反铁电薄膜中介电常数对温度的变化
5. A one milliKelvin top-loading dilution refrigerator and demagnetization cryostat, and, The electric field dependence of the dielectric constant in amorphous materials at ultra-low temperatures. [D] . Tigner, Benjamin. 1994

机译：1毫开尔文顶部加载的稀释制冷机和去磁低温恒温器，以及超低温下非晶态材料中介电常数的电场依赖性。
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Simultaneous achievement of high dielectric constant and low temperature dependence of capacitance in (111)-oriented BaTiO3-Bi(Mg0.5Ti0.5)O3-BiFeO3 solid solution thin films

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